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Structural and electrical properties of (ZnO)k*Me2O3 (Me = Al, Ga, In) ceramics activated with halogens and zinc

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dc.contributor.author COLIBABA, G. V.
dc.contributor.author KOLTSOV, M. A.
dc.contributor.author RUSNAC, D.
dc.contributor.author UNTILA, D.
dc.contributor.author SPALATU, N.
dc.date.accessioned 2026-10-14T08:26:02Z
dc.date.available 2026-10-14T08:26:02Z
dc.date.issued 2026
dc.identifier.citation COLIBABA, G. V.; M. A. KOLTSOV; D. RUSNAC; D. UNTILA and N. SPALATU. Structural and electrical properties of (ZnO)k*Me2O3 (Me = Al, Ga, In) ceramics activated with halogens and zinc. In: 10th International Symposium on Dielectric Materials and Application, Abstract Book, ISyDMA’10, Chisinau, Republic of Moldova, 30 June - 4 July, 2026. Technical University of Moldova. Chişinău: 2026, p. 90. en_US
dc.identifier.uri https://repository.utm.md/handle/5014/37404
dc.description This work was supported under the project No. 25.80013.5007.10RE. en_US
dc.description.abstract High-power magnetron sputtering is one of the most reproducible methods for the deposition of ZnO thin films with high structural perfection and low contamination level. The highest film quality requires homogeneous, highly thermally conductive ceramic targets, sintered at extremely high temperatures (1500 °C). Recently, a new lowtemperature method for sintering ZnO based on chemical vapor transport (CVT) has been proposed. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject magnetron targets en_US
dc.subject vapor transport en_US
dc.subject controllable conductivity en_US
dc.title Structural and electrical properties of (ZnO)k*Me2O3 (Me = Al, Ga, In) ceramics activated with halogens and zinc en_US
dc.type Article en_US


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